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Techno(Stress) and Techno(Distress): Validation of a Specific TechnoStressors Index (TSI) Among Quebec Lawyers

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Title:Techno(Stress) and Techno(Distress): Validation of a Specific TechnoStressors Index (TSI) Among Quebec Lawyers
Authors:Cadieux, Nathalie
Cadieux, Jean
Youssef, Nancy
Mosconi, Elaine
Keywords:The Dark Side of Information Technology Use
lawyer
professional
psychological distress
technostress
show 2 moretechnostress index
the dark side of information technology
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Date Issued:07 Jan 2020
Abstract:The pervasive and ubiquitous characteristics of information technology has been associated to technostress. Current measures oftechnostress do not consider some recent issues of the stress generated by technology in the day-to-day work of lawyers. This paper presents the validation of a 25-item self-report scale (TechnoStressors-Index-TSI) for the study of technostress in lawyers’ professional context. Items were constructed through qualitative exploratory interviews (N=22) and adaptation of existing scales. The scale was tested (N=40) and retested (N=2027) among Quebec lawyers using EFA and CFA. This scale proposes a second order reflexive model of five dimensions to understand technostress. The scale validation among a large sample of professionals helped to fulfill the gap regarding specific techno-stressors to which lawyers are exposed and leading to technostress at work or other health outcomes, such as psychological distress. For further research, it needs to be validated with other professionals to confirm its relevance in different contexts.
Pages/Duration:10 pages
URI:http://hdl.handle.net/10125/64489
ISBN:978-0-9981331-3-3
DOI:10.24251/HICSS.2020.747
Rights:Attribution-NonCommercial-NoDerivatives 4.0 International
https://creativecommons.org/licenses/by-nc-nd/4.0/
Appears in Collections: The Dark Side of Information Technology Use


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