Technostress and Multiple Organizational Social Media – Investigating Negative and Positive Stressors and Strains from a Person-Technology-Fit Perspective

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dc.contributor.author Högberg, Karin
dc.date.accessioned 2020-12-24T19:34:01Z
dc.date.available 2020-12-24T19:34:01Z
dc.date.issued 2021-01-05
dc.description.abstract Multiple organizational social media (MOSM) foster new ways of communication, interaction and new encounters for organizations that can cause stress. Earlier research on social media and technostress have focused on negative stressors, hence there is a lack of studies focusing on both positive and negative stressors deriving from social media. In this study, both negative and positive stressors and strains deriving from using MOSM are studied in an international hotel chain with employees in eight European countries over a period of seven years. The results indicate that techno stressors such as work overload, work-life conflict, and changing algorithms creates negative stressors. However, positive stressors such as the ability to create new ways of providing service was also found. The study makes a theoretical contribution to technostress research in the Information Systems research field by uncovering both positive and negative stressors and strains created over time as well as suggests a development of the Person-Technology fit model.
dc.format.extent 10 pages
dc.identifier.doi 10.24251/HICSS.2021.339
dc.identifier.isbn 978-0-9981331-4-0
dc.identifier.uri http://hdl.handle.net/10125/70953
dc.language.iso English
dc.relation.ispartof Proceedings of the 54th Hawaii International Conference on System Sciences
dc.rights Attribution-NonCommercial-NoDerivatives 4.0 International
dc.rights.uri https://creativecommons.org/licenses/by-nc-nd/4.0/
dc.subject Digital and Social Media in Enterprise
dc.subject multuple organizational social media
dc.subject techno-distress
dc.subject techno-eustress
dc.subject technostress
dc.title Technostress and Multiple Organizational Social Media – Investigating Negative and Positive Stressors and Strains from a Person-Technology-Fit Perspective
prism.startingpage 2780
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